Invention Grant
- Patent Title: Pattern forming method
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Application No.: US15453540Application Date: 2017-03-08
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Publication No.: US10578965B2Publication Date: 2020-03-03
- Inventor: Akiko Iimura , Toshiki Ito
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C09D133/06 ; C09D133/08 ; G03F7/16 ; C09D135/02 ; G03F7/004 ; G03F1/80 ; B29K105/00 ; B29C59/02

Abstract:
A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the curable composition (A1) layer to lay the droplets, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a Distance in Hansen space Ra((a1)−(A2)) between the component (a1) serving as a polymerizable compound in the curable composition (A1) and the curable composition (A2) being 6 or less.
Public/Granted literature
- US10539869B2 Pattern forming method Public/Granted day:2020-01-21
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