Invention Grant
- Patent Title: Mask blank with resist film and method for manufacturing the same and method for manufacturing transfer mask
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Application No.: US15327519Application Date: 2015-07-27
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Publication No.: US10578960B2Publication Date: 2020-03-03
- Inventor: Toru Fukui
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-164855 20140813
- International Application: PCT/JP2015/071195 WO 20150727
- International Announcement: WO2016/024474 WO 20160218
- Main IPC: G03F1/20
- IPC: G03F1/20 ; G03F7/11 ; G03F7/095 ; G03F7/32 ; G03F1/00 ; G03F7/004 ; G03F7/038 ; G03F7/20
Abstract:
A mask blank with resist film, including a substrate having a thin film; and a negative resist film formed on a main surface of the thin film, wherein in the resist film, a photoacid generator-rich region in which concentration of a photoacid generator is high compared to other region of the resist film, is formed at a portion where the resist film is in contact with the thin film.
Public/Granted literature
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