Invention Grant
- Patent Title: Polishing composition for magnetic disk substrate
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Application No.: US16169668Application Date: 2018-10-24
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Publication No.: US10577445B2Publication Date: 2020-03-03
- Inventor: Toru Iwata
- Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Applicant Address: JP
- Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Current Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Current Assignee Address: JP
- Agency: Bracewell LLP
- Agent Brad Y. Chin
- Main IPC: C09G1/00
- IPC: C09G1/00 ; C09G1/02 ; C09G1/04 ; C08F220/06 ; C08F220/14 ; C08F220/56 ; C08F228/02 ; G11B23/50 ; C08K3/36
Abstract:
Embodiments relate to a polishing composition is an aqueous composition containing at least colloidal silica, wet-process silica particles, and a water-soluble polymer compound. The water-soluble polymer compound is a copolymer containing a monomer having a carboxylic acid group, a monomer having an amide group, and a monomer having a sulfonic acid group as essential monomers.
Public/Granted literature
- US20190119423A1 POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE Public/Granted day:2019-04-25
Information query
