Invention Grant
- Patent Title: Bipolar semiconductor device and manufacturing method
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Application No.: US12512285Application Date: 2009-07-30
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Publication No.: US10566462B2Publication Date: 2020-02-18
- Inventor: Hans-Joachim Schulze , Frank Pfirsch , Franz-Josef Niedernostheide
- Applicant: Hans-Joachim Schulze , Frank Pfirsch , Franz-Josef Niedernostheide
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L29/861
- IPC: H01L29/861

Abstract:
A bipolar semiconductor device and method are provided. One embodiment provides a bipolar semiconductor device including a first semiconductor region of a first conductivity type having a first doping concentration, a second semiconductor region of a second conductivity type forming a pn-junction with the first semiconductor region, and a plurality of third semiconductor regions of the first conductivity type at least partially arranged in the first semiconductor region and having a doping concentration which is higher than the first doping concentration. Each of the third semiconductor regions is provided with at least one respective junction termination structure.
Public/Granted literature
- US20110024791A1 BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD Public/Granted day:2011-02-03
Information query
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