- Patent Title: Power semiconductor device and method for manufacturing the same
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Application No.: US16054472Application Date: 2018-08-03
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Publication No.: US10566422B2Publication Date: 2020-02-18
- Inventor: Tae Hoon Lee , Jun Hee Cho , Jin Seong Chung
- Applicant: Magnachip Semiconductor, Ltd.
- Applicant Address: KR Cheongju-su
- Assignee: MagnaChip Semiconductor, Ltd.
- Current Assignee: MagnaChip Semiconductor, Ltd.
- Current Assignee Address: KR Cheongju-su
- Agency: NSIP Law
- Priority: KR10-2018-0031056 20180316
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/08 ; H01L29/66 ; H01L29/417 ; H01L23/522 ; H01L29/10 ; H01L21/265 ; H01L29/40

Abstract:
A power semiconductor device includes a drain region and a source region disposed on a substrate, a gate insulating layer and a gate electrode disposed on the substrate and disposed between the drain region and the source region, a protection layer in contact with a top surface of the substrate and a top surface of the gate electrode, a source contact plug connected to the source region, a drain contact plug connected to the drain region, and a field plate plug in contact with the protection layer, wherein a width of the field plate plug is greater than a width of the source contact plug or a width of the drain contact plug.
Public/Granted literature
- US20190288066A1 POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2019-09-19
Information query
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