Invention Grant
- Patent Title: Manufacturing method of semiconductor device
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Application No.: US15773169Application Date: 2016-11-02
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Publication No.: US10566307B2Publication Date: 2020-02-18
- Inventor: Yuu Hasegawa , Naoki Sekine , Yoshihito Hagiwara
- Applicant: SHINKAWA LTD.
- Applicant Address: JP Tokyo
- Assignee: SHINKAWA LTD.
- Current Assignee: SHINKAWA LTD.
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP2015-217215 20151105
- International Application: PCT/JP2016/082698 WO 20161102
- International Announcement: WO2017/078109 WO 20170511
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/00 ; H01L23/66

Abstract:
The disclosure includes: a first lifting step for bonding a wire at a first position (13) with a capillary and for lifting the capillary up to a first height H1 while feeding the wire; a circular arc lifting step for carrying out a circular arc motion for moving the capillary in a circular arc toward a second position (14) by a first distance (L5), and then carrying out a lifting motion for lifting the capillary while feeding the wire; a circular arc motion step for moving the capillary in a circular arc toward the first position (13) by a second distance (L3+L4); a second lifting step for lifting the capillary up to a second height H4; and a looping step for looping the capillary to the second position (14), thereby forming a wire loop having a predetermined height on a substrate by bonding the wire at the second position (14).
Public/Granted literature
- US20180323166A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2018-11-08
Information query
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