- Patent Title: Abatement and strip process chamber in a load lock configuration
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Application No.: US13746831Application Date: 2013-01-22
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Publication No.: US10566205B2Publication Date: 2020-02-18
- Inventor: Martin Jeffrey Salinas , Paul B. Reuter , Andrew Nguyen , Jared Ahmad Lee
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/306 ; H01L21/02

Abstract:
Embodiments of the present invention a load lock chamber including two or more isolated chamber volumes, wherein one chamber volume is configured for processing a substrate and another chamber volume is configured to provide cooling to a substrate. One embodiment of the present invention provides a load lock chamber having at least two isolated chamber volumes formed in a chamber body assembly. The at least two isolated chamber volumes may be vertically stacked. A first chamber volume may be used to process a substrate disposed therein using reactive species. A second chamber volume may include a cooled substrate support.
Public/Granted literature
- US20130224953A1 ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION Public/Granted day:2013-08-29
Information query
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