Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive element, method for producing substrate with resist pattern, and method for producing printed wiring board
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Application No.: US15510211Application Date: 2015-09-14
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Publication No.: US10564543B2Publication Date: 2020-02-18
- Inventor: Shota Okade , Yukiko Muramatsu , Emiko Oota , Ken Sawabe , Sanchoru Ri
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, L.L.P.
- Priority: JP2014-190158 20140918
- International Application: PCT/JP2015/076041 WO 20150914
- International Announcement: WO2016/043162 WO 20160324
- Main IPC: G03F7/033
- IPC: G03F7/033 ; G03F7/032 ; G03F7/11 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; H05K3/06 ; C08F212/08 ; G03F7/029 ; C09D125/14 ; G03F7/027 ; G03F7/031 ; H05K3/18

Abstract:
A photosensitive resin composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R1, R2 and R3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R1s, R2s, and R3s independently may be the same or different.
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Information query
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