Invention Grant
- Patent Title: Photolithography mask plate
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Application No.: US15684244Application Date: 2017-08-23
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Publication No.: US10564539B2Publication Date: 2020-02-18
- Inventor: Mo Chen , Qun-Qing Li , Li-Hui Zhang , Yuan-Hao Jin , Dong An , Shou-Shan Fan
- Applicant: Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: CN201611093543 20161201
- Main IPC: G03F1/48
- IPC: G03F1/48 ; G03F7/20 ; G03F7/30 ; G03F1/50
Abstract:
A photolithography mask plate, the photolithography mask plate including: a substrate; a carbon nanotube layer on the substrate; a patterned chrome layer on the carbon nanotube layer, wherein the patterned chrome layer and the carbon nanotube layer have the same pattern; a cover layer on the patterned chrome layer.
Public/Granted literature
- US20180157163A1 PHOTOLITHOGRAPHY MASK PLATE Public/Granted day:2018-06-07
Information query
