Invention Grant
- Patent Title: Quantum cascade laser, light emitting device, method for fabricating a semiconductor laser
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Application No.: US16006708Application Date: 2018-06-12
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Publication No.: US10554021B2Publication Date: 2020-02-04
- Inventor: Hiroyuki Yoshinaga
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JP2017-119596 20170619
- Main IPC: H01S5/34
- IPC: H01S5/34 ; H01S5/227 ; H01S5/343 ; H01S5/042 ; H01S5/10 ; H01S5/02 ; H01S5/022 ; H01S5/028

Abstract:
A quantum cascade laser includes: a laser structure having a first region, a second region, and a third region, the first region having an end face; a high-specific resistance region on principal surfaces of the first and second regions; a metal layer on a principal surface of the third region; a dielectric film on the end face and the high-specific resistance region; and a reflective metal film on the dielectric film, the end face and the high-specific resistance region. The first to third regions are arranged in a direction of a first axis. The laser structure has a semiconductor mesa and a semiconductor base that mounts the semiconductor mesa. The high-specific resistance region has a wall or terrace providing a difference in level at a boundary between the first and second regions, the wall or terrace extending in a direction of a second axis intersecting that of the first axis.
Public/Granted literature
- US20180366911A1 QUANTUM CASCADE LASER, LIGHT EMITTING DEVICE, METHOD FOR FABRICATING A SEMICONDUCTOR LASER Public/Granted day:2018-12-20
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