- Patent Title: System and method for controlling semiconductor manufacturing facility, method of manufacturing integrated circuit using the system and method, and method of manufacturing processor using the system and method
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Application No.: US15950303Application Date: 2018-04-11
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Publication No.: US10553464B2Publication Date: 2020-02-04
- Inventor: Jae Won Jeong , Yi Jin , Chang Gi Min , Jin Woo Lee , Seok Heo , Yong Won Choi , Yun Jong Choi
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2017-0121221 20170920
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G05B19/418
Abstract:
A method for controlling a semiconductor manufacturing facility includes measuring output change amounts of differential pressure sensors in the facility when pressure conditions change by a number of fans. The fans are then classified into different groups and subgroups and control sequences of the subgroups are determined based on the change amounts. Difference values are then calculated, and a control signal is generated to adjust the rotation speed of the fans.
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