- Patent Title: Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle
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Application No.: US15946087Application Date: 2018-04-05
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Publication No.: US10551735B2Publication Date: 2020-02-04
- Inventor: Seongjun Jeong , Hyeonjin Shin , Sangwon Kim , Seongjun Park , Minsu Seol , Dongwook Lee , Yunseong Lee , Alum Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0095713 20170727
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/62 ; G03F1/22
Abstract:
A pellicle composition for a photomask, a pellicle for a photomask, the pellicle for a photomask being formed from the pellicle composition, a method of forming the pellicle, a reticle including the pellicle, and an exposure apparatus for lithography including the reticle are provided. The pellicle composition includes: at least one selected from graphene quantum dots and a graphene quantum dot precursor, the graphene quantum dots having a size of about 50 nm or less; and a solvent.
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