- Patent Title: SOFC interconnect barriers and methods of making same using masks
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Application No.: US15790023Application Date: 2017-10-22
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Publication No.: US10541429B2Publication Date: 2020-01-21
- Inventor: Jeffrey F. Roeder , Peter C. Van Buskirk
- Applicant: Jeffrey F. Roeder , Peter C. Van Buskirk
- Applicant Address: US CT Bethel
- Assignee: Sonata Scientific LLC
- Current Assignee: Sonata Scientific LLC
- Current Assignee Address: US CT Bethel
- Agent Gregory Stauf
- Main IPC: G03F1/00
- IPC: G03F1/00 ; H01M8/021 ; H01M8/0215 ; H01M8/0228 ; H01M8/124

Abstract:
A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.
Public/Granted literature
- US20180062183A1 SOFC INTERCONNECT BARRIERS AND METHODS OF MAKING SAME USING MASKS Public/Granted day:2018-03-01
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