Invention Grant
- Patent Title: Vertical thin film transistors with isolation
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Application No.: US15823628Application Date: 2017-11-28
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Publication No.: US10541273B2Publication Date: 2020-01-21
- Inventor: Seje Takaki
- Applicant: SanDisk Technologies LLC
- Applicant Address: US TX Addison
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Addison
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/24 ; H01L27/11524 ; H01L27/11551 ; H01L27/11578 ; H01L29/423 ; H01L29/66 ; H01L27/1157 ; H01L27/11582 ; H01L45/00

Abstract:
A method is provided that includes forming a transistor by forming a gate dielectric layer above a substrate, forming a spacer dielectric layer above the gate dielectric layer, and forming a gate adjacent the gate dielectric layer and above the spacer dielectric layer.
Public/Granted literature
- US20190165044A1 VERTICAL THIN FILM TRANSISTORS WITH ISOLATION Public/Granted day:2019-05-30
Information query
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