Invention Grant
- Patent Title: Optical bench on substrate
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Application No.: US16247332Application Date: 2019-01-14
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Publication No.: US10539751B2Publication Date: 2020-01-21
- Inventor: Wan-Yu Lee , Chun-Hao Tseng , Hai-Ching Chen , Tien-I Bao
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G02B6/42
- IPC: G02B6/42 ; H01S5/022 ; H01S5/00

Abstract:
A method of making an optical bench includes forming a trench in a substrate and wherein the trench has a sloping side, forming a reflector layer over the sloping side, depositing a redistribution layer over the substrate, disposing an under bump metallization (UBM) layer over the redistribution layer, depositing a passivation layer over the redistribution layer and surrounding sidewalls of the UBM layer, and mounting an optical component over an uppermost portion of the substrate, wherein the optical component is electrically connected to a through substrate via (TSV) extending through the substrate. The reflector layer is configured to reflect an electromagnetic wave from the optical component, and wherein the optical component is mounted outside the trench.
Public/Granted literature
- US20190146165A1 OPTICAL BENCH ON SUBSTRATE Public/Granted day:2019-05-16
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