Invention Grant
- Patent Title: Nanoscale SOFC electrode architecture engineered using atomic layer deposition
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Application No.: US14814881Application Date: 2015-07-31
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Publication No.: US10529975B2Publication Date: 2020-01-07
- Inventor: Xueyan Song , Yun Chen , Kirk Gerdes , Shiwoo Lee
- Applicant: West Virginia University
- Applicant Address: US WV Morgantown
- Assignee: West Virginia University
- Current Assignee: West Virginia University
- Current Assignee Address: US WV Morgantown
- Agency: Thomas|Horstemeyer, LLP
- Main IPC: H01M4/04
- IPC: H01M4/04 ; H01M4/86 ; H01M4/88 ; H01M8/12 ; H01M8/1213 ; H01M8/1246 ; H01M8/124

Abstract:
One embodiment includes forming surface-modifying phases on a surface of a functional electrode via atomic layer deposition and controlling the chemistry of constituent phases, the crystalline nature of the constituent phases and the thickness of the surface-modifying phase via the atomic layer deposition such that the thickness is between about 2 nm to about 200 nm. The surface-modifying phases enhances the performance of electrocatalytic activity of the functional electrode and the device.
Public/Granted literature
- US20170062799A1 NANOSCALE SOFC ELECTRODE ARCHITECTURE ENGINEERED USING ATOMIC LAYER DEPOSITION Public/Granted day:2017-03-02
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