Invention Grant
- Patent Title: Semiconductor structure and manufacturing method thereof
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Application No.: US15459691Application Date: 2017-03-15
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Publication No.: US10529666B2Publication Date: 2020-01-07
- Inventor: Chen-Hua Yu , Kai-Chiang Wu , Chun-Lin Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C.
- Agent Anthony King
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/31 ; H01L25/00 ; H01L25/065 ; H01L23/00 ; H01L21/56

Abstract:
A semiconductor structure includes a first die; a first molding encapsulating the first die; a second die disposed over the first molding, and including a first surface, a second surface opposite to the first surface, and a sidewall between the first surface and the second surface; and a second molding disposed over the first molding and surrounding the second die, wherein the first surface of the second die faces the first molding, and the second die is at least partially covered by the second molding.
Public/Granted literature
- US20180151501A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-05-31
Information query
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