Invention Grant
- Patent Title: Coating compositions for use with an overcoated photoresist
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Application No.: US15363533Application Date: 2016-11-29
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Publication No.: US10527942B2Publication Date: 2020-01-07
- Inventor: Jae Hwan Sim , Jung Kyu Jo , EunHye Cho , Hye-Won Lee , Jin Hong Park , Eui-Hyun Ryu , Jae-Bong Lim
- Applicant: Rohm and Haas Electronic Materials Korea Ltd.
- Applicant Address: KR Cheonan, Chungcheongnam-do
- Assignee: Rohm and Haas Electronics Materials Korea Ltd.
- Current Assignee: Rohm and Haas Electronics Materials Korea Ltd.
- Current Assignee Address: KR Cheonan, Chungcheongnam-do
- Agency: Mintz Levin Cohn Ferris Glovksy and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/20 ; C08L35/06 ; G03F7/30 ; G03F7/40 ; C09D167/02 ; C09D125/18 ; H01L21/02 ; C08F220/34 ; H01L21/027 ; C08F220/38 ; C08F220/26 ; H01L21/311 ; C08F220/18 ; C08F220/30 ; C08F220/32 ; C08G63/685 ; C08G63/78 ; C09D5/00 ; C09D133/08 ; C09D133/14 ; C09D167/00 ; G03F7/16 ; G03F7/32

Abstract:
In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.
Public/Granted literature
- US20170153547A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2017-06-01
Information query
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