Invention Grant
- Patent Title: Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
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Application No.: US15539560Application Date: 2015-12-14
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Publication No.: US10494358B2Publication Date: 2019-12-03
- Inventor: Takumi Toida , Masatoshi Echigo , Takashi Sato , Takashi Makinoshima
- Applicant: Mitsubishi Gas Chemical Company, Inc.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2014-262564 20141225
- International Application: PCT/JP2015/084907 WO 20151214
- International Announcement: WO2016/104214 WO 20160630
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/20 ; G03F7/30 ; G03F7/16 ; C07D311/78 ; C09D161/06 ; C08G8/08 ; C08G8/04 ; C08G18/30

Abstract:
A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.
Public/Granted literature
Information query
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