Invention Grant
- Patent Title: Thin-film transistor (TFT) and manufacturing method thereof, array substrate and manufacturing method thereof, and display device
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Application No.: US15558104Application Date: 2017-02-24
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Publication No.: US10403756B2Publication Date: 2019-09-03
- Inventor: Jinchao Bai , Huibin Guo , Young Tae Hong
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201610311349 20160511
- International Application: PCT/CN2017/074772 WO 20170224
- International Announcement: WO2017/193667 WO 20171116
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; H01L29/66 ; H01L21/77 ; H01L29/08 ; H01L29/10

Abstract:
Embodiments of the present invention relate to a thin-film transistor (TFT) and a manufacturing method thereof, an array substrate and a manufacturing method thereof, and a display device. The TFT includes an active layer, an amorphous silicon (a-Si) connecting layer and a source-drain electrode layer. The active layer includes a channel region, a source region and a drain region; forming materials of the channel region include polycrystalline silicon (poly-Si); the a-Si connecting layer is disposed on a side of the active layer and includes a first connecting part and a second connecting part which are spaced from each other; the source-drain electrode layer includes a source electrode and a drain electrode which are spaced to each other; the source electrode is electrically connected with the source region through the first connecting part; and the drain electrode is electrically connected with the drain electrode through the second connecting part.
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