- Patent Title: Semiconductor memory device and method of manufacturing the same
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Application No.: US15989477Application Date: 2018-05-25
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Publication No.: US10403634B2Publication Date: 2019-09-03
- Inventor: Sung-Min Hwang , Joon-Sung Lim , Gilsung Lee , Eunsuk Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd
- Current Assignee: Samsung Electronics Co., Ltd
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0073390 20170612; KR10-2017-0146814 20171106
- Main IPC: H01L27/11573
- IPC: H01L27/11573 ; G11C16/24 ; H01L27/11582 ; H01L27/1157

Abstract:
A semiconductor memory device includes a cell array region and a peripheral circuit region. The cell array region includes an electrode structure including a plurality of electrodes sequentially stacked on a body conductive layer, and vertical structures penetrating the electrode structure so as to be connected to the body conductive layer. The peripheral circuit region includes a remaining substrate on the body conductive layer. The remaining substrate includes a buried insulating layer, and a peripheral active layer that is provided on the buried insulating layer and is substantially single-crystalline.
Public/Granted literature
- US20180358372A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-12-13
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