Invention Grant
- Patent Title: Power semiconductor device
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Application No.: US16078349Application Date: 2016-05-26
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Publication No.: US10403559B2Publication Date: 2019-09-03
- Inventor: Masaru Fuku , Noriyuki Besshi , Ryuichi Ishii , Takayuki Yamada , Takao Mitsui , Komei Hayashi
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Agent Richard C. Turner
- International Application: PCT/JP2016/065550 WO 20160526
- International Announcement: WO2017/203650 WO 20171130
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/373 ; H01L23/48 ; H01L21/3205 ; H01L23/522 ; H01L21/52 ; H01L25/07 ; H01L21/768 ; H01L25/18 ; H01L23/043 ; H01L23/367 ; H01L23/00

Abstract:
In a power semiconductor device, the thickness dimension of a protective film of a semiconductor element is made smaller than that of an upper electrode, so a protective film is not pressed by being pressurized from upward when bonded by a metal sintered body, and the force of tearing off the upper electrode riding on an inclined surface of the protective film does not act, so that no crack of the upper electrode occurs, thus maintaining the soundness of the semiconductor element. Also, a lead bonded by a solder to the upper electrode of the semiconductor element is made of a copper-Invar clad material, the linear expansion coefficient of which is optimized, and thereby it is possible to realize a durability superior to that of a heretofore known wire-bonded aluminum wiring.
Public/Granted literature
- US20190074236A1 POWER SEMICONDUCTOR DEVICE Public/Granted day:2019-03-07
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