Invention Grant
- Patent Title: High purity tin and method for manufacturing same
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Application No.: US15574039Application Date: 2016-10-12
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Publication No.: US10400342B2Publication Date: 2019-09-03
- Inventor: Toru Imori , Kouichi Takemoto
- Applicant: JX NIPPON MINING & METALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2015-205923 20151019
- International Application: PCT/JP2016/080276 WO 20161012
- International Announcement: WO2017/069027 WO 20170427
- Main IPC: C22B9/04
- IPC: C22B9/04 ; C25C1/14 ; C22B25/08 ; G03F7/20 ; H05G2/00
Abstract:
Provided is a high purity tin (Sn) having an extremely low oxygen content. A high purity tin having a tin purity of 5N (99.999% by mass, provided that carbon, nitrogen, oxygen and hydrogen are excluded) or more, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS.
Public/Granted literature
- US20180298506A1 HIGH PURITY TIN AND METHOD FOR MANUFACTURING SAME Public/Granted day:2018-10-18
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