Invention Grant
- Patent Title: Internal surface electron beam-irradiating device
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Application No.: US16066578Application Date: 2016-11-15
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Publication No.: US10398794B2Publication Date: 2019-09-03
- Inventor: Hiroyuki Daiku , Takeshi Noda , Ichiro Sakai
- Applicant: HITACHI ZOSEN CORPORATION
- Applicant Address: JP Osaka
- Assignee: HITACHI ZOSEN CORPORATION
- Current Assignee: HITACHI ZOSEN CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: JP2015-255594 20151228
- International Application: PCT/JP2016/083800 WO 20161115
- International Announcement: WO2017/115572 WO 20170706
- Main IPC: A61L2/08
- IPC: A61L2/08 ; B65B55/08 ; G21K5/04 ; A61L2/26

Abstract:
An internal surface electron beam-irradiating device sterilizes the internal surface of a vial by irradiation with an electron beam. The internal surface electron beam-irradiating device includes an electron beam generator that generates the electron beam, a vacuum chamber containing the electron beam generator, an output window that emits the electron beam to the outside of the vacuum chamber, and an extension nozzle that guides an electron cloud formed by extending the electron beam emitted from the output window. The extension nozzle includes a leaking section that leaks the electron cloud. The leaking section includes empty portions that discharge part of the electron cloud to the outside, and a component portion that guides the electron cloud into the leaking section.
Public/Granted literature
- US20190015535A1 INTERNAL SURFACE ELECTRON BEAM-IRRADIATING DEVICE Public/Granted day:2019-01-17
Information query
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