Invention Grant
- Patent Title: Charged particle beam writing apparatus and method for calculating irradiation coefficient
-
Application No.: US15070719Application Date: 2016-03-15
-
Publication No.: US10381196B2Publication Date: 2019-08-13
- Inventor: Hironobu Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-059594 20150323; JP2015-196137 20151001
- Main IPC: H01J37/302
- IPC: H01J37/302 ; H01J37/317

Abstract:
A charged particle beam writing apparatus includes an enlarged pattern forming circuitry to form an enlarged pattern by enlarging a figure pattern to be written, depending on a shift number which is defined by the number of writing positions shifted in the x or y direction in plural writing positions where multiple writing is performed while shifting the position, a reduced pattern forming circuitry to form a reduced pattern by reducing the figure pattern, depending on the shift number, and an irradiation coefficient calculation circuitry to calculate an irradiation coefficient for modulating a dose of a charged particle beam irradiating each of small regions, using the enlarged and reduced patterns.
Public/Granted literature
- US20160284509A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2016-09-29
Information query