Invention Grant
- Patent Title: Semiconductor device having auxiliary electrode formed in field plate region
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Application No.: US15709815Application Date: 2017-09-20
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Publication No.: US10374077B2Publication Date: 2019-08-06
- Inventor: Yong Keon Choi
- Applicant: DONGBU HITEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: DB Hitek Co., Ltd
- Current Assignee: DB Hitek Co., Ltd
- Current Assignee Address: KR Seoul
- Agency: Patterson Thuente Pedersen, P.A.
- Priority: KR10-2016-0121566 20160922
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08 ; H01L29/10 ; H01L29/40 ; H01L29/66 ; H01L29/78 ; H01L29/423

Abstract:
A semiconductor device includes a source region disposed in a substrate and having a first conductivity type, a drain region disposed in the substrate and having the first conductivity type, a first drift region having the first conductivity type and extending in a channel length direction between the source and drain regions, a second drift region having a second conductivity type and extending parallel to the first drift region, a field plate region disposed in an upper portion of the second drift region, an auxiliary electrode disposed in an upper portion of the field plate region, and a gate electrode disposed on the substrate and electrically connected with the auxiliary electrode. Such devices can reduce the specific on-resistance while also reducing electric field concentrations at the edge portions of the gate electrode, and the breakdown voltage of the device can therefore be significantly improved.
Public/Granted literature
- US20180083135A1 SEMICONDUCTOR DEVICE HAVING AUXILIARY ELECTRODE FORMED IN FIELD PLATE REGION Public/Granted day:2018-03-22
Information query
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