Semiconductor device having auxiliary electrode formed in field plate region
Abstract:
A semiconductor device includes a source region disposed in a substrate and having a first conductivity type, a drain region disposed in the substrate and having the first conductivity type, a first drift region having the first conductivity type and extending in a channel length direction between the source and drain regions, a second drift region having a second conductivity type and extending parallel to the first drift region, a field plate region disposed in an upper portion of the second drift region, an auxiliary electrode disposed in an upper portion of the field plate region, and a gate electrode disposed on the substrate and electrically connected with the auxiliary electrode. Such devices can reduce the specific on-resistance while also reducing electric field concentrations at the edge portions of the gate electrode, and the breakdown voltage of the device can therefore be significantly improved.
Information query
Patent Agency Ranking
0/0