Invention Grant
- Patent Title: Substrate and method of manufacturing the same
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Application No.: US15945762Application Date: 2018-04-05
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Publication No.: US10342129B2Publication Date: 2019-07-02
- Inventor: Shigeo Iriguchi , Takahiro Kitagawa , Mitsunori Abe , Shigeru Sugino , Nobuo Taketomi , Kiyoyuki Hatanaka , Ryo Kanai
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Priority: JP2017-083949 20170420
- Main IPC: H05K1/18
- IPC: H05K1/18 ; H05K1/11 ; H05K1/03 ; H05K3/00 ; H05K3/22 ; H01R12/71

Abstract:
A substrate includes an insulation layer including a glass cloth impregnated with a resin, and a through hole having a hole included in the insulation layer and plating formed in an inner surface of the hole, where a location, intersecting with the glass cloth, of an outer circumferential portion of the through hole has a recessed portion recessed toward an outside of the hole.
Public/Granted literature
- US20180310405A1 SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-10-25
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