- Patent Title: Substrate transfer teaching method and substrate processing system
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Application No.: US15422293Application Date: 2017-02-01
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Publication No.: US10340175B2Publication Date: 2019-07-02
- Inventor: Hiromitsu Sakaue
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: JP2016-016954 20160201
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67 ; H01L21/677 ; H01L21/68

Abstract:
A method includes a first step of vertically moving the arm or the pins from a reference position in one direction by a predetermined distance, a second step of moving the arm in a horizontal direction, a third step of vertically moving the arm or the pins moved in the one direction in the other direction by a distance equal to or greater than the predetermined distance, a fourth step of detecting a horizontal position of the substrate held by the arm with respect to the arm. The steps are repeated. Whenever the processes are performed, the reference position in the first step is shifted in the one direction by the predetermined distance, and a vertical position of the arm or the pins which is obtained when the horizontal position of the substrate detected in the fourth step is deviated from a preset position is taught as the delivery position.
Public/Granted literature
- US20170217017A1 SUBSTRATE TRANSFER TEACHING METHOD AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2017-08-03
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