Invention Grant
- Patent Title: Mounting table and plasma processing apparatus
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Application No.: US14160735Application Date: 2014-01-22
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Publication No.: US10340174B2Publication Date: 2019-07-02
- Inventor: Shin Yamaguchi , Daisuke Hayashi , Yasuhisa Kudo
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2013-009455 20130122
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01L21/67 ; H01J37/32 ; H01L21/687 ; H01L21/683

Abstract:
A mounting table includes an electrostatic chuck having a mounting surface and a backside opposite to the mounting surface, a first through hole being formed in the mounting table; a base joined to the backside of the electrostatic chuck and having a second through hole in communication with the first through hole; a lifter pin which is received in a pin hole formed by the first through hole and the second through hole, the lifter pin being movable up and down to protrude beyond and retract below the mounting surface. An upper end portion of the lifter pin has a shape in which a diameter decreases toward a lower end of the lifter pin to correspond to a shape of the upper end portion of the pin hole. The upper end portion of the lifter pin is in surface contact with the upper end portion of the pin hole.
Public/Granted literature
- US20140202635A1 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS Public/Granted day:2014-07-24
Information query
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