Invention Grant
- Patent Title: Monolayer film mediated precision film deposition
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Application No.: US15658133Application Date: 2017-07-24
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Publication No.: US10340137B2Publication Date: 2019-07-02
- Inventor: Peter Ventzek , Alok Ranjan
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Main IPC: C23C14/02
- IPC: C23C14/02 ; C23C16/32 ; H01L21/02 ; C23C16/455 ; H01L21/3105

Abstract:
A method of forming a thin film is described. The method includes treating at least a portion of a surface exposed on a substrate with an adsorption-promoting agent to alter a functionality of the exposed surface and cause subsequent adsorption of an organic precursor, and thereafter, adsorbing the organic precursor to the functionalized surface to form a carbon-containing film. Then, at least a portion of the surface of the carbon-containing film is exposed to an ion flux to mix the adsorbed carbon-containing film with the material of the underlying substrate and form a mixed film.
Public/Granted literature
- US20180025908A1 MONOLAYER FILM MEDIATED PRECISION FILM DEPOSITION Public/Granted day:2018-01-25
Information query
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