Invention Grant
- Patent Title: Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
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Application No.: US14148606Application Date: 2014-01-06
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Publication No.: US10340126B2Publication Date: 2019-07-02
- Inventor: Peter Maschwitz
- Applicant: AGC Flat Glass North America, Inc. , Asahi Glass Co., Ltd. , AGC Glass Europe S.A.
- Applicant Address: US GA Alpharetta JP Tokyo BE Louvain-la Neuve
- Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,ASAHI GLASS CO., LTD.,AGC GLASS EUROPE
- Current Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,ASAHI GLASS CO., LTD.,AGC GLASS EUROPE
- Current Assignee Address: US GA Alpharetta JP Tokyo BE Louvain-la Neuve
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/00 ; H01J37/32 ; C23C16/40 ; C23C16/455 ; C23C16/503 ; H05H1/24 ; C03C17/245 ; C23C16/513 ; H05H1/42 ; H05H1/46
Abstract:
The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.
Public/Granted literature
- US10580624B2 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition Public/Granted day:2020-03-03
Information query
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