Invention Grant
- Patent Title: PN junction-based electrical fuse using reverse-bias breakdown to induce an open conduction state
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Application No.: US15704617Application Date: 2017-09-14
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Publication No.: US10283648B2Publication Date: 2019-05-07
- Inventor: Pascal Fornara
- Applicant: STMicroelectronics (Rousset) SAS
- Applicant Address: FR Rousset
- Assignee: STMicroelectronic (Rousset) SAS
- Current Assignee: STMicroelectronic (Rousset) SAS
- Current Assignee Address: FR Rousset
- Agency: Crowe & Dunlevy
- Priority: FR1751665 20170301
- Main IPC: G11C17/16
- IPC: G11C17/16 ; H01L27/12 ; H01L23/525 ; H01L27/112 ; H01L29/8605 ; H01L27/06 ; H01L29/06

Abstract:
A fuse device is formed by a PN junction semiconducting region that is electrically insulated from other portions of an integrated circuit. The fuse device includes a first semiconducting zone having P type of conductivity and a second semiconducting zone having N type of conductivity in contact at a PN junction. First and second electrically conducting contact zones are provided on the first and second semiconducting zone, respectively, without making contact with the PN junction. One of the first and second semiconducting zones is configured with a non-homogeneous concentration of dopants, where a region with a lower value of concentration of dopant is located at the PN junction and a region with a higher value of concentration of dopant is locates at the corresponding electrically conducting contact zone.
Public/Granted literature
- US20180254353A1 INTEGRATED FUSE DEVICE Public/Granted day:2018-09-06
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