In one aspect of the present disclosure, a semiconductor device includes a channel layer, an AlxIn1-xN layer on the channel layer with a thickness of t1, and a reverse polarization layer on the AlxIn1-xN layer with a thickness of t2. The thickness is 0.5×t1≤t2≤3×t1. In another aspect of the present disclosure, a method of manufacturing a semiconductor device is provided. The method including: forming a channel layer on a substrate; forming an AlxIn1-xN layer on the channel layer with a thickness of t1; and forming a reverse polarization layer on the AlxIn1-xN layer with a thickness of t2. The thickness is 0.5×t1≤t2≤3×t1.