Invention Grant
- Patent Title: PVD plasma control using a magnet edge lift mechanism
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Application No.: US14458334Application Date: 2014-08-13
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Publication No.: US10283331B2Publication Date: 2019-05-07
- Inventor: Keith A. Miller
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35

Abstract:
Apparatus for providing a magnetic field within a process chamber are provided herein. In some embodiments, an apparatus for providing a magnetic field within a process chamber includes: an inner rotating mechanism including a first plate having a central axis, wherein the first plate includes and a first plurality of magnets and is rotatable about the central axis; and an outer lifting mechanism including a ring disposed proximate the first plate, the ring having a second plurality of magnets coupled to a bottom surface of the ring proximate the peripheral edge of the ring, wherein the ring is movable in a direction perpendicular to the first plate.
Public/Granted literature
- US20150075970A1 PVD PLASMA CONTROL USING A MAGNET EDGE LIFT MECHANISM Public/Granted day:2015-03-19
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