- Patent Title: Distributed multi-zone plasma source systems, methods and apparatus
-
Application No.: US13649103Application Date: 2012-10-10
-
Publication No.: US10283325B2Publication Date: 2019-05-07
- Inventor: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
Public/Granted literature
- US20140096908A1 DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS Public/Granted day:2014-04-10
Information query
