Invention Grant
- Patent Title: Aperture for inspecting multi beam, beam inspection apparatus for multi beam, and multi charged particle beam writing apparatus
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Application No.: US15665853Application Date: 2017-08-01
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Publication No.: US10283316B2Publication Date: 2019-05-07
- Inventor: Hiroshi Yamashita , Munehiro Ogasawara
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-155739 20160808
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/30 ; H01J37/317 ; H01J37/153
Abstract:
In one embodiment, an aperture for inspecting a multi-beam allows passage of one beam among multi-beams applied in a multi-beam writing apparatus. The aperture includes a scattering layer that is provided with a through-hole through which the one beam passes, and by which the other beams are scattered, and an absorbing layer that is provided with an opening having a diameter greater than the diameter of the through-hole and that absorbs at least some of the beams entering it.
Public/Granted literature
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