Invention Grant
- Patent Title: Method for fabricating a magnetic material stack
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Application No.: US15281466Application Date: 2016-09-30
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Publication No.: US10283249B2Publication Date: 2019-05-07
- Inventor: Hariklia Deligianni , Bruce B. Doris , Eugene J. O'Sullivan , Naigang Wang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Vazken Alexanian
- Main IPC: H01F7/06
- IPC: H01F7/06 ; H01F17/04 ; H01F41/34 ; H01F41/14

Abstract:
A method for fabricating a magnetic material stack on a substrate includes the following steps. A first dielectric layer is formed. A first magnetic material layer is formed on the first dielectric layer. At least a second dielectric layer is formed on the first magnetic material layer. At least a second magnetic material layer is formed on the second dielectric layer. During one or more of the forming steps, a surface smoothing operation is performed to remove at least a portion of surface roughness on the layer being formed. The magnetic material stack can be used to form a low magnetic loss yoke inductor.
Public/Granted literature
- US20180096771A1 MAGNETIC MATERIAL STACK AND MAGNETIC INDUCTOR STRUCTURE FABRICATED WITH SURFACE ROUGHNESS CONTROL Public/Granted day:2018-04-05
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