- Patent Title: Nonvolatile memory device having ferroelectric memory element and resistive memory element and method of writing signal in nonvolatile memory device having the same
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Application No.: US15632113Application Date: 2017-06-23
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Publication No.: US10283184B2Publication Date: 2019-05-07
- Inventor: Joong Sik Kim
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon
- Assignee: SK HYNIX INC.
- Current Assignee: SK HYNIX INC.
- Current Assignee Address: KR Icheon
- Priority: KR10-2016-0140284 20161026
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L29/78 ; H01L27/11597 ; H01L43/02 ; H01L43/08 ; H01L43/10 ; H01L45/00 ; G11C11/00 ; G11C11/56 ; G11C11/16

Abstract:
Disclosed is a nonvolatile memory device. The nonvolatile memory device includes a ferroelectric memory element including a field effect transistor having a ferroelectric gate dielectric layer and a drain electrode. The nonvolatile memory device also includes a resistive memory element electrically connected in series to the drain electrode of the field effect transistor. A multilevel signal is stored in the nonvolatile memory device according to a channel resistance of the ferroelectric memory element and a resistance of the resistive memory element.
Public/Granted literature
- US20180114560A1 NONVOLATILE MEMORY DEVICE AND METHOD OF WRITING SIGNAL IN NONVOLATILE MEMORY DEVICE Public/Granted day:2018-04-26
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