Invention Grant
- Patent Title: Gas detection device
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Application No.: US15243611Application Date: 2016-08-22
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Publication No.: US10281444B2Publication Date: 2019-05-07
- Inventor: Tamio Ikehashi , Hiroaki Yamazaki
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2016-107802 20160530
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01B7/16

Abstract:
A gas detection device includes a substrate having a main surface and a movable film structure located on, and including a portion thereof spaced from, the main surface of the substrate. The portion of the movable film structure located over and spaced from the substrate includes a first film formed of an insulating material, a patterned second film which deforms as a result of absorbing or adsorbing a predetermined gas, and a patterned third film comprising a resistive heater, at least a portion of the movable film structure spaced from the substrate being movable with respect to the substrate. From the perspective of a direction perpendicular to the main surface of the substrate, at least a portion of a pattern of the second film overlaps at least a portion of a pattern of the third film.
Public/Granted literature
- US20170343522A1 GAS DETECTION DEVICE Public/Granted day:2017-11-30
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