Invention Grant
- Patent Title: Substrate processing apparatus
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Application No.: US15019212Application Date: 2016-02-09
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Publication No.: US10262876B2Publication Date: 2019-04-16
- Inventor: Hiroaki Takahashi , Yuto Kubo
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2015-27959 20150216; JP2015-27960 20150216
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/02

Abstract:
A substrate holding unit which holds the substrate, a nozzle which includes a first cylindrical member within which a first flow path along which the first fluid is passed is formed and in which a tip end edge of the first cylindrical member defines, between the tip end edge and a main surface of the substrate, an annular first discharge port that discharges the fluid flowing through the first flow path along the main surface of the substrate radially and a first fluid supply unit which is a fluid supply unit supplying the first fluid to the first flow path of the nozzle and which applies, to the nozzle, a force in a direction apart from the main surface of the substrate, by the discharge of the first fluid from the first discharge port.
Public/Granted literature
- US20160240400A1 SUBSTRATE PROCESSING APPARATUS Public/Granted day:2016-08-18
Information query
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