Invention Grant
- Patent Title: Vertical MOSFET
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Application No.: US15335459Application Date: 2016-10-27
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Publication No.: US10256292B2Publication Date: 2019-04-09
- Inventor: Shinya Takashima , Katsunori Ueno , Masaharu Edo
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2015-242234 20151211
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/20 ; H01L29/10 ; H01L29/78

Abstract:
In order to improve the dynamic characteristics of a vertical MOSFET using GaN, it is an objective of the present invention to reduce the resistance of a current path with a long hole movement distance in a p-type well. Provided is a vertical MOSFET including a gallium nitride layer having a main surface that is a non-polar surface; a p-type well region that is provided with a stripe shape in the main surface of the gallium nitride layer; and a stripe-shaped electrode provided above the p-type well region. Hole mobility is higher in a direction orthogonal to an extension direction of the stripe-shaped electrode than in the extension direction, among directions in a plane parallel to the main surface.
Public/Granted literature
- US20170170258A1 VERTICAL MOSFET Public/Granted day:2017-06-15
Information query
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