- Patent Title: High-brightness light-emitting diode with surface microstructures
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Application No.: US15284917Application Date: 2016-10-04
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Publication No.: US10249791B2Publication Date: 2019-04-02
- Inventor: Chaoyu Wu , Kunhuang Cai , Yi-An Lu , Chun-Yi Wu , Ching-Shan Tao , Duxiang Wang
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201410138259 20140408
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/30 ; H01L33/22 ; H01L21/66 ; H01L33/00 ; H01L33/06 ; H01L33/40

Abstract:
A high-brightness light-emitting diode with surface microstructure and preparation and screening methods thereof are provided. The ratio of total roughened surface area of light transmission surface of a light emitting diode to vertically projected area is greater than 1.5, and the peak density of light transmission surface is not less than 0.3/um2. The higher the ratio of total roughened surface area of an epitaxial wafer to vertically projected area and the higher the number of peak over the critical height within a unit area, the more beneficial to improve light extraction efficiency of the epitaxial wafer. As a result, light extraction efficiency of the epitaxial wafer is greatly improved.
Public/Granted literature
- US20170025577A1 High-Brightness Light-Emitting Diode with Surface Microstructures Public/Granted day:2017-01-26
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