Invention Grant
- Patent Title: Light emitting diode and fabrication method therof
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Application No.: US15871043Application Date: 2018-01-14
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Publication No.: US10249790B2Publication Date: 2019-04-02
- Inventor: Huan-shao Kuo , Chun-Yi Wu , Chaoyu Wu , Ching-Shan Tao , Duxiang Wang
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201610151425 20160317
- Main IPC: H01L33/26
- IPC: H01L33/26 ; H01L33/08 ; H05B33/08 ; H01L33/40 ; F21Y115/10 ; H01L33/12 ; H01L33/32

Abstract:
A light emitting diode includes a segmented quantum well formed via selective growth method to avoid re-absorption effect of photons in the LED internal quantum well. This improves external extraction efficiency and increases luminance. The light emitting diode includes a first semiconductor layer, an active layer, and a second semiconductor layer, wherein, the upper surface of the first semiconductor layer has a first growth region and a second growth region; the active layer is formed only in the first growth region via selective epitaxial growth; and the second semiconductor layer covers the active layer and the second growth region of the first semiconductor layer via epitaxial growth.
Public/Granted literature
- US20180151776A1 Light Emitting Diode and Fabrication Method Thereof Public/Granted day:2018-05-31
Information query
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