- Patent Title: High-speed diode with crystal defects and method of manufacturing
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Application No.: US15597556Application Date: 2017-05-17
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Publication No.: US10249751B2Publication Date: 2019-04-02
- Inventor: Jun Takaoka
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2016-100861 20160519
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L29/78 ; H01L29/06 ; H01L29/66 ; H01L29/167 ; H01L29/32 ; H01L29/40 ; H01L29/16 ; H01L29/36

Abstract:
A high-speed diode includes an n-type semiconductor layer and a p-type semiconductor layer which is laminated on the n-type semiconductor layer, where a pn junction is formed in a boundary portion between the n-type semiconductor layer and the p-type semiconductor layer, and crystal defects are formed such that the frequency of appearance is gradually decreased from the upper surface of the p-type semiconductor layer toward the bottom surface of the n-type semiconductor layer.
Public/Granted literature
- US20170338335A1 HIGH-SPEED DIODE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-11-23
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