High-speed diode with crystal defects and method of manufacturing
Abstract:
A high-speed diode includes an n-type semiconductor layer and a p-type semiconductor layer which is laminated on the n-type semiconductor layer, where a pn junction is formed in a boundary portion between the n-type semiconductor layer and the p-type semiconductor layer, and crystal defects are formed such that the frequency of appearance is gradually decreased from the upper surface of the p-type semiconductor layer toward the bottom surface of the n-type semiconductor layer.
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