Invention Grant
- Patent Title: Low resistance contact structures for trench structures
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Application No.: US15591385Application Date: 2017-05-10
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Publication No.: US10249724B2Publication Date: 2019-04-02
- Inventor: Praneet Adusumilli , Alexander Reznicek , Oscar van der Straten , Chih-Chao Yang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/06 ; H01L29/40 ; H01L29/45 ; H01L29/66 ; H01L29/78 ; H01L21/285 ; H01L21/768 ; H01L23/485 ; H01L23/528 ; H01L23/532 ; H01L23/535 ; H01L27/088 ; H01L29/417

Abstract:
An electrical device including at least one contact surface and an interlevel dielectric layer present atop the electrical device, wherein the interlevel dielectric layer includes at least one trench to the at least one contact surface of the electrical device. A conformal titanium liner is present on the sidewalls of the trench and is in direct contact with the at least one contact surface. The conformal titanium liner may be composed of 100 wt. % titanium, and may have a thickness ranging from 10Å to 100Å.
Public/Granted literature
- US20170243824A1 LOW RESISTANCE CONTACT STRUCTURES FOR TRENCH STRUCTURES Public/Granted day:2017-08-24
Information query
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