Invention Grant
- Patent Title: Composite charged particle beam apparatus and control method thereof
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Application No.: US15534219Application Date: 2014-12-26
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Publication No.: US10249471B2Publication Date: 2019-04-02
- Inventor: Toshihide Agemura
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- International Application: PCT/JP2014/084454 WO 20141226
- International Announcement: WO2016/103432 WO 20160630
- Main IPC: H01J37/073
- IPC: H01J37/073 ; H01J37/28 ; H01J37/317 ; H01J37/30 ; H01J37/305 ; H01J37/24

Abstract:
The present invention relates to an automatic sequence for repeatedly performing SEM observation and FIB processing by using a low acceleration voltage for a long time. In order to realize very accurate three-dimensional structure/composition analysis, in the automatic sequence for repeatedly performing sample observation using a scanning electron microscope using a CFE electron source and sample processing using a FIB device, low temperature flushing using the CFE electron source is performed at predetermined timing except for a SEM observation time. According to the present invention, the automatic sequence for repeatedly performing the sample observation using the scanning electron microscope using the CFE electron source and the sample processing using the FIB device can be performed for a long time. Therefore, it is possible to acquire a SEM image which achieves high resolution and improved current stability while the low acceleration voltage is used.
Public/Granted literature
- US20170330722A1 COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF Public/Granted day:2017-11-16
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