Invention Grant
- Patent Title: Ion trapping device with insulating layer exposure prevention and method for manufacturing same
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Application No.: US15520108Application Date: 2017-04-19
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Publication No.: US10248911B2Publication Date: 2019-04-02
- Inventor: Taehyun Kim , Dongil Cho , Seokjun Hong , Minjae Lee , Hongjin Cheon
- Applicant: SK TELECOM CO., LTD. , SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Applicant Address: CH Genève KR Seoul
- Assignee: ID QUANTIQUE,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee: ID QUANTIQUE,SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
- Current Assignee Address: CH Genève KR Seoul
- Agency: Hauptman Ham, LLP
- Priority: KR10-2014-0150078 20141031
- Main IPC: G06N99/00
- IPC: G06N99/00 ; H01L49/00 ; H01J3/00 ; H01J49/00

Abstract:
An ion trap device is provided as well as a method of manufacturing the ion trap device including a substrate, central DC electrode, RF electrode, side electrode and an insulating layer. Disposed over the substrate, the central DC electrode includes DC connector pad and DC rail connected thereto. The RF electrode includes RF rail adjacent to the DC rail and RF pad connected to RF rail. The side electrode has RF electrode disposed between thereof and the central DC electrode. The insulating layer supports one of the central DC electrode, RF electrode and side electrode, on a top surface of the substrate. The insulating layer includes first insulating layer and second insulating layer disposed over the first insulating layer, and the second insulating layer includes an overhang protruding with respect to the first insulating layer in a width direction of the ion trap device.
Public/Granted literature
- US20170316335A1 ION TRAPPING DEVICE WITH INSULATING LAYER EXPOSURE PREVENTION AND METHOD FOR MANUFACTURING SAME Public/Granted day:2017-11-02
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