Invention Grant
- Patent Title: Method for producing an antireflection layer on a silicone surface and optical element
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Application No.: US14693627Application Date: 2015-04-22
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Publication No.: US10247856B2Publication Date: 2019-04-02
- Inventor: Ulrike Schulz , Friedrich Rickelt , Peter Munzert , Norbert Kaiser
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Applicant Address: DE Munich
- Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee Address: DE Munich
- Agency: Slater Matsil, LLP
- Priority: DE102014105939 20140428
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/3065 ; H01L21/3213 ; G02B1/111 ; G02B1/18 ; G02B1/12 ; G02B1/118
Abstract:
A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.
Public/Granted literature
- US20150309214A1 Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element Public/Granted day:2015-10-29
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