Invention Grant
- Patent Title: Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
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Application No.: US15024815Application Date: 2014-09-18
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Publication No.: US10222701B2Publication Date: 2019-03-05
- Inventor: Chuangxin Zhao , Sander Baltussen , Pär Mårten Lukas Broman , Richard Joseph Bruls , Cristian Bogdan Craus , Jan Groenewold , Dzmitry Labetski , Kerim Nadir , Hendrikus Gijsbertus Schimmel , Christian Felix Wählisch
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14170928 20140603; EP14180122 20140807
- International Application: PCT/EP2014/069935 WO 20140918
- International Announcement: WO2015/055374 WO 20150423
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; H05G2/00
Abstract:
A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
Public/Granted literature
- US20160209753A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD, SENSOR SYSTEM AND SENSING METHOD Public/Granted day:2016-07-21
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