Invention Grant
- Patent Title: Method and device for improving the SAFT analysis when measuring irregularities
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Application No.: US14761833Application Date: 2013-10-23
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Publication No.: US10222352B2Publication Date: 2019-03-05
- Inventor: Hubert Mooshofer
- Applicant: SIEMENS AKTIENGESELLSCHAFT
- Applicant Address: DE Munich
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee Address: DE Munich
- Agency: Slayden Grubert Beard PLLC
- Priority: DE102013201975 20130207
- International Application: PCT/EP2013/072181 WO 20131023
- International Announcement: WO2014/121858 WO 20140814
- Main IPC: G01N29/04
- IPC: G01N29/04 ; G01N29/24 ; G01N29/34 ; G01N29/44 ; G01S15/89 ; G01N29/06 ; G01N29/26 ; G01N29/265 ; G01S7/52

Abstract:
The invention relates to a method and to a corresponding device in which irregularities regarding each detected measurement position within a measurement surface are detected using a local measurement density. Each echo signal received in response to each detected measurement position is then weighted in order to generate an image using a data processing device such that the irregularities are adjusted.
Public/Granted literature
- US20150346157A1 METHOD AND DEVICE FOR IMPROVING THE SAFT ANALYSIS WHEN MEASURING IRREGULARITIES Public/Granted day:2015-12-03
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